Argonne National Laboratory Nanofilter
Collaborative users from Creatv MicroTech, Inc. and Los Alamos National Laboratory, working with Argonne National Laboratory Center for Nanoscale Materials' (CNM) Nanofabrication & Devices Group, have demonstrated a novel fabrication process that produces high-porosity polymer nanofilters with smooth, uniform and straight pores and high aspect ratios.
The goal of nanopatterning research at the Center for Nanoscale Materials (CNM) is to provide nanofabrication support to all CNM scientific groups and to develop new nanofabrication techniques. The tool set includes state-of-the-art electron-beam nanopatterning, focused-ion-beam nanopatterning, nanoimprint, optical lithography, and advanced pattern transfer and thin-film deposition and synthesis capabilities.
Nanofilters have a wide range of applications for various size-exclusion-based separations in bioseparation and nanomedicine, such as laboratory assays, removing bacteria and viruses, drug delivery devices, implants, and sieving of nanoscale materials.
The manufacturing process uses electron-beam lithography and energetic neutral atom beam lithography and epitaxy (ENABLE) techniques. This technique allows for the fabrication of ordered hole arrays of a predetermined size and shape with high density. The method has the potential to produce a new generation of high-precision, high-porosity, bio-compatible filters with pore sizes down to 100 nanometers.
Further information:
O.V. Makarova, C-M. Tang, P. Amstutz, R. Divan, A. Imre, D.C. Mancini, M. Hoffbauer, and T. Williamson, J. Vac. Sci. Technol. B, 27, 2585-2587 (2009)
