ASML Netherlands B.V. (Veldhoven, NL) inventor Oscar Franciscus Jozephus Noordman discloses a system for controlling the energy of laser radiation pulses used in semiconductor fabrication in U.S. Patent 7,626,182. A detector monitors energy of the pulses and an optical shutter trims the radiation pulses after a suitable optical delay line. The accuracy of the control of the energy of the radiation pulses can be improved by matching a rate of response of the radiation detector to a rate of response of the optical shutter. The excimer laser provides a radiation source generating pulses of radiation that have consistent energy levels. In addition, the radiation pulse energy control system can be used as part of a lithographic apparatus. For example, the radiation pulse energy control system can be configured to adjust the energy of the pulses of radiation that are input to, or output from, the illuminator.
According to U.S. Patent 7,626,182 , applications include the manufacture of integrated circuits, integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, micro-electromechanical devices (MEMS), light emitting diodes (LEDs), etc. Also, for instance in a flat panel display, the laser can be used to assist in the creation of a variety of layers, e.g. a thin film transistor layer and/or a color filter layer.
The laser can be used in optical lithography as well as in imprint lithography. In imprint lithography a topography in a patterning device defines the pattern created on a substrate. The topography of the patterning device can be pressed into a layer of resist supplied to the substrate whereupon the resist is cured by applying electromagnetic radiation, heat, pressure or a combination thereof. The patterning device is moved out of the resist leaving a pattern in it after the resist is cured.
A new iRAP report "NANOLITHOGRAPHY EQUIPMENT FOR IT, ELECTRONICS AND PHOTONICS – A TECHNOLOGY, INDUSTRY AND GLOBAL MARKET ANALYSIS" examines equipment used in manufacturing devices at the nanoscale.
